International renowned experts

The scientific as well as the industrial committee consists of a number of independent experts. They are responsible for the review of the contributions and assure the outstanding scientific quality (scientific papers) respectively their relevance for application (industrial papers).  

 

These are the members of our review committees:

Scientific Committee of LANE 2018

C. B. Arnold, Princeton University, USA

P. Aubry, CEA/Paris-Saclay University, France

S. Barcikowski, University of Duisburg-Essen, Germany

P. Bartolo, University of Manchester, United Kingdom

J.-P. Bergmann, Technische Universität Ilmenau, Germany

M. Booth, University of Oxford, United Kingdom
D. Bourell, The University of Texas at Austin, USA

M. Brandt, RMIT University, Australia

B. Chichkov, Laser Zentrum Hannover e.V., Germany

A. Clare, The University of Nottingham, United Kingdom
G. Dearden, University of Liverpool, United Kingdom

P. Delaporte, Aix-Marseille Université, France

I. Drstvenšek, University of Maribor, Slovenia
D. Drummer, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany
J. Duflou, KU Leuven, Belgium

C. Emmelmann, Hamburg University of Technology, Germany
R. Fabbro, Arts et Métiers ParisTech, France
T. Frick, Technische Hochschule Nürnberg Georg Simon Ohm, Germany
A. Gebhardt, FH Aachen University of Applied Sciences, Germany

M. Geiger, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

E. Govekar, University of Ljubljana, Slovenia

T. Graf, University of Stuttgart, Germany

C. Grigoropoulos, University of California at Berkeley, USA

D. P. Hand, Heriot-Watt University, United Kingdom
H. Huber, Munich University of Applied Sciences, Germany

Y. Ito, Nagaoka University of Technology, Japan

A. Jesacher, Medical University of Innsbruck, Austria

W. Jüptner, Universität Bremen, Germany

S. Kaierle, Laser Zentrum Hannover e.V., Germany
A. Kaplan, Luleå University of Technology, Sweden

S. Katayama, Osaka University, Japan
I. Kelbassa, Siemens AG, Germany

D. Kracht, Laser Zentrum Hannover e.V., Germany

P. Krakhmalev, Karlstad University, Sweden

J.-P. Kruth, KU Leuven, Belgium
V. Kujanpää, VTT Technical Research Centre of Finland, Finland

B. Lauwers, KU Leuven, Belgium

G. Levy, TTA Technology Turn Around, Switzerland

C. Leyens, Technische Universität Dresden, Germany

 

 

L. Li, The University of Manchester, United Kingdom

P. Loosen, RWTH Aachen University, Germany

J. Meijer, University of Twente, The Netherlands
M. Merklein,
Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

I. Miyamoto, Osaka University, Japan

C. L. Molpeceres Alvarez, Technical University of Madrid, Spain

S.-J. Na, KAIST, Republic of Korea

B. Neuenschwander, Bern University of Applied Sciences, Switzerland

S. Nolte, Friedrich Schiller University Jena, Germany

S. Olschok, RWTH Aachen University, Germany

A. Ostendorf, Ruhr-Universität Bochum, Germany
A. Otto, Vienna University of Technology, Austria
L. Overmeyer, Laser Zentrum Hannover e.V., Germany

D. Petring, Fraunhofer Institute for Laser Technology ILT, Germany
A. Piqué, U.S. Naval Research Laboratory, USA
J. M. Pou, University of Vigo, Spain

U. Reisgen, RWTH Aachen University, Germany

M. Rethmeier, Bundesanstalt für Materialforschung und -prüfung, Germany
G.-W. Römer, University of Twente, The Netherlands
A. Salminen, Lappeenranta University of Technology LUT, Finland

P. Salter, University of Oxford, United Kingdom

M. Schmidt, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

R. Schmitt, Fraunhofer Institute for Production Technology IPT, Germany

W. Schulz, Fraunhofer Institute for Laser Technology ILT, Germany

I. Smurov, École Nationale d'Ingénieurs de Saint-Etienne, France

K. Sugioka, RIKEN Center for Advanced Photonics, Japan

H.-K. Tönshoff, Leibniz Universität Hannover, Germany

E. Toyserkani, University of Waterloo, Canada

O. Tsuneyuki, National Institute of Scientific Research (INRS), Canada
G. Turichin, Peter the Great St.Petersburg Polytechnic University, Russia
R. Vallée, Université Laval, Canada
F. Vollertsen, BIAS GmbH, Germany

K. Wegener, ETH Zurich, Switzerland
W. L. Weingärtner, Universidade Federal de Santa Catarina, Brazil

G. Witt, University of Duisburg-Essen, Germany
M. F. Zäh, Technische Universität München, Germany
Z. Zalevsky, Bar-IIan University, Israel
M. Zhong, Tsinghua University, China

D. Zibar, Technical University of Denmark, Denmark

 


Industrial Committee of LANE 2018

H. Amler, Photon Energy GmbH, Germany

P. Galarneau, Institut National d'Optique (INO), Canada

G. Hennig, Daetwyler Graphics AG, Switzerland
P. Hoffmann, ERLAS Erlanger Lasertechnik GmbH, Germany
R. Holtz, Class 4 Laser Professionals AG, Switzerland

M. Kogel-Hollacher, Precitec GmbH & Co. KG, Germany

J. K. Larsson, Autokropolis Engineering, Sweden
K. Löffler, TRUMPF Laser- und Systemtechnik GmbH, Germany

C. Merklein, Schaeffler Technologies AG & Co. KG, Germany

F. Oefele, BMW AG, Germany

D. Schmid, AUDI AG, Germany
P. Weidinger, Brose Fahrzeugteile GmbH & Co. KG, Germany