Internationally renowned experts

The International Committee consists of a number of independent experts. They are reviewing the contributions to the conference to assure the outstanding scientific quality of scientific papers and additionally the relevance for application of industrial papers.  

 

These are the members of our review committee:

International Review Committee of LANE 2020

H. Amler, Photon Energy GmbH, Germany

M. Apel, Access e. V., Germany

C. B. Arnold, Princeton University, USA

P. Aubry, CEA/Université Paris-Saclay, France

S. Barcikowski, University of Duisburg-Essen, Germany

P. Bartolo, The University of Manchester, United Kingdom

J. P. Bergmann, Technische Universität Ilmenau, Germany
D. Bourell, The University of Texas at Austin, USA

M. Brandt, RMIT University, Australia

B. Chichkov, Laser Zentrum Hannover e.V., Germany

S. Christiansen, Fraunhofer IKTS, Germany

A. Clare, The University of Nottingham, United Kingdom
G. Dearden, University of Liverpool, United Kingdom

P. Delaporte, Aix-Marseille Université, France

I. Drstvenšek, University of Maribor, Slovenia
D. Drummer, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany
J. Duflou, KU Leuven, Belgium

C. Emmelmann, Hamburg University of Technology, Germany
R. Fabbro, Arts et Métiers ParisTech, France

A. Fougères, Institut National d'Optique (INO), Canada

T. Frick, Technische Hochschule Nürnberg Georg Simon Ohm, Germany

P. Galarneau, Institut National d'Optique (INO), Canada

E. Govekar, University of Ljubljana, Slovenia

T. Graf, University of Stuttgart, Germany

C. Grigoropoulos, University of California at Berkeley, USA

D. P. Hand, Heriot-Watt University, United Kingdom

G. Hennig, Daetwyler Graphics AG, Switzerland

P. Hoffmann, ERLAS Erlanger Lasertechnik GmbH, Germany

R. Holtz, University of Applied Sciences and Arts Northwestern Switzerland

H. Huber, Munich University of Applied Sciences, Germany

Y. Ito, Nagaoka University of Technology, Japan

A. Jesacher, Medical University of Innsbruck, Austria

W. Jüptner, Universität Bremen, Germany

S. Kaierle, Laser Zentrum Hannover e.V., Germany
A. Kaplan, Luleå University of Technology, Sweden

S. Katayama, Osaka University, Japan

M. Kogel-Hollacher, Precitec GmbH & Co. KG, Germany

D. Kracht, Laser Zentrum Hannover e.V., Germany

P. Krakhmalev, Karlstad University, Sweden

J.-P. Kruth, KU Leuven, Belgium
V. Kujanpää, Lappeenranta University of Technology LUT, Finland

M. Lang, SKZ, Germany

J. K. Larsson, Autokropolis Engineering, Sweden

B. Lauwers, KU Leuven, Belgium

G. Levy, TTA Technology Turn Around, Switzerland

C. Leyens, Technische Universität Dresden, Germany

L. Li, The University of Manchester, United Kingdom

K. Löffler, TRUMPF Lasertechnik GmbH, Germany

A. Malshe, University of Arkansas, USA

J. Meijer, University of Twente, The Netherlands

J. Mergheim, Friedrich–Alexander Universität Erlangen–Nürnberg, Germany

 

 

 

C. Merklein, Schaeffler Technologies AG & Co. KG, Germany

M. Merklein, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

I. Miyamoto, Osaka University, Japan

C. L. Molpeceres Alvarez, Technical University of Madrid, Spain

S.-J. Na, Xi‘an Jiaotong University, China

B. Neuenschwander, Bern University of Applied Sciences, Switzerland

S. Nolte, Friedrich Schiller University Jena, Germany

F. Oefele, BMW AG, Germany

Y. Okamoto, Okayama University, Japan

S. Olschok, RWTH Aachen University, Germany

L. Orazi, University of Modena & Reggio Emilia, Italy

A. Ostendorf, Ruhr-Universität Bochum, Germany
A. Otto, Vienna University of Technology, Austria
L. Overmeyer, Laser Zentrum Hannover e.V., Germany

F. Palm, Airbus Defence and Space GmbH, Germany

M. Pereira, Universidade Federal de Santa Catarina, Brazil

D. Petring, Fraunhofer ILT, Germany

F. E. Pfefferkorn, University of Wisconsin-Madison, USA

A. Piqué, U.S. Naval Research Laboratory, USA

P. Plapper, University of Luxembourg, Luxembourg
J. M. Pou, University of Vigo, Spain

R. Ramsayer, Robert Bosch GmbH, Germany

U. Reisgen, RWTH Aachen University, Germany

M. Rethmeier, Bundesanstalt für Materialforschung und -prüfung, Germany
G.-W. Römer, University of Twente, The Netherlands

L. Romoli, University of Parma, Italy
A. Salminen, Lappeenranta University of Technology LUT, Finland

P. Salter, University of Oxford, United Kingdom

M. Schaper, Paderborn University, Germany

D. Schmid, AUDI AG, Germany

M. Schmidt, Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany

R. Schmitt, Fraunhofer IPT, Germany

W. Schulz, Fraunhofe ILT, Germany

V. Schulze, Karlsruhe Institute of Technology, Germany

J. Sehrt, Ruhr-Universität Bochum, Germany

I. Smurov, École Nationale d'Ingénieurs de Saint-Etienne, France

K. Sugioka, RIKEN Center for Advanced Photonics, Japan

H.-K. Tönshoff, Leibniz Universität Hannover, Germany

E. Toyserkani, University of Waterloo, Canada

J. Tremel, Robert Bosch GmbH, Germany

G. Turichin, Peter the Great St.Petersburg Polytechnic University, Russia

F. Vollertsen, BIAS GmbH, Germany

K. Wegener, ETH Zurich, Switzerland
P. Weidinger, Brose Fahrzeugteile GmbH & Co. KG, Germany

G. Witt, University of Duisburg-Essen, Germany

K. Wudy, Technische Universität München, Germany

M. F. Zäh, Technische Universität München, Germany
Z. Zalevsky, Bar-IIan University, Israel
M. Zhong, Tsinghua University, China

D. Zibar, Technical University of Denmark, Denmark