Internationally renowned experts

The international review committee consists of a number of independent experts. They are reviewing the contributions to the conference to assure the outstanding scientific quality of the scientific papers and additionally the relevance for application of the industrial papers.  

 

These are the members of our review committee:

International Review Committee of LANE 2022

C.B. Arnold,  Princeton University, USA

P. Aubry, University of Paris-Saclay, France

S. Barcikowski, University of Duisburg-Essen, Germany

P.J. Bartolo, University of Manchester, United Kingdom

J.P. Bergmann, Technische Universität Ilmenau, Germany

M. Booth, University of Oxford, United Kingdom

D. Bourell, University of Texas at Austin, USA

M. Brandt, RMIT University, Australia

B. Chichkov, Leibniz University Hannover, Germany

A. Clare, University of Nottingham, United Kingdom

R.  Daub, Fraunhofer Institute for Casting, Composite and Processing Technology IGCV, Germany

I. Drstvenšek, University of Maribor, Slovenia

D. Drummer, Friedrich–Alexander Universität Erlangen–Nürnberg, Germany

J. Duflou, KU Leuven, Belgium

C. Emmelmann, Hamburg University of Technology, Germany

R. Fabbro, Arts et Métiers ParisTech, France

A, Fougères, Institut National d'Optique, Canada

T. Frick, Technische Hochschule Nürnberg Georg Simon Ohm, Germany

P. Galarneau, Institut National d'Optique, Canada

A. Gebhardt, Aachen University of Applied Sciences, Germany

E. Govekar, University of Ljubljana, Slovenia

D.P. Hand, Heriot-Watt University, United Kingdom

G. Hennig, Daetwyler Graphics AG, Schweiz

P. Hoffmann, ERLAS GmbH, Deutschland

R. Holtz, University of Applied Sciences and Arts Northwestern, Switzerland          

H. Huber, Munich University of Applied Sciences, Germany

Y. Ito Nagaoka, University of Technology, Japan

A. Jesacher, Medical University of Innsbruck, Austria

W. Jüptner, Universität Bremen, Germany

S. Kaierle, Laser Zentrum Hannover e.V., Germany

A. Kaplan, Luleå University of Technology, Schweden

M. Kogel-Hollacher, Precitec Optronik GmbH, Germany

D. Kracht, Laser Zentrum Hannover e.V., Germany

P. Krakhmalev, Karlstad University, Schweden

J.P. Kruth, KU Leuven, Belgium

V. Kujanpää, Lappeenranta University of Technology, Finland

J.K. Larsson, Autokropolis Engineering, Schweden

B. Lauwers, KU Leuven, Belgium

G. Levy, TTA Technology Turn Around, Switzerland

C. Leyens, Dresden University of Technology, Germany

L. Li, University of Manchester, United Kingdom

K. Löffler, Von Ardenne GmbH, Germany

J. Meijer, University of Twente, Netherlands

C. Merklein, Schaeffler Technologies AG & Co. KG, Germany

M. Merklein, Friedrich–Alexander Universität Erlangen–Nürnberg, Germany

I. Miyamoto, Osaka University, Japan

C. Molpeceres, Technical University of Madrid, Spain

S.-J. Na, Xi'an Jiaotong University, China

 

S. Nolte, Friedrich Schiller University Jena, Germany

S. Olschok, RWTH Aachen University, Germany

A. Ostendorf, Ruhr-Universität Bochum, Germany

A. Otto, Vienna University of Technology, Austria

L. Overmeyer, Laser Zentrum Hannover e.V., Germany

F. Palm, Airbus, France

M. Pereira, UFSC, Brazil

D. Petring, Fraunhofer Institute for Laser Technology ILT, Germany

F.E. Pfefferkorn, University of Wisconsin–Madison, USA

H. Piili, University of Turku, Finland

A. Piqué, Naval Research Laboratory, Germany

P. Plapper, Université du Luxembourg, Luxembourg

J. Pou, University of Vigo, Spain

R. Ramsayer, Robert Bosch GmbH, Germany

U. Reisgen, RWTH Aachen, Germany

M. Rethmeier, Bundesanstalt für Materialforschung und -prüfung, Germany

G.-W. Römer, University of Twente, Netherlands

A. Salminen, University of Turku, Finland

P. Salter, University of Oxford, United Kingdom

I. Smurov, Ecole Nationale d'Ingénieurs de Saint-Etienne, France

K. Sugioka, RIKEN Center for Advanced Photonics, Japan

H. K.  Tönshoff, Leibniz Universität Hannover, Germany

E. Toyserkani, University of Waterloo, Canada

J. Tremel, Robert Bosch GmbH, Germany

R. Vallée, Université Laval, Canada

F. Vollertsen, Bremer Institut für angewandte Strahltechnik GmbH, Germany

K. Wegener, ETH Zürich, Switzerland

P. Weidinger, Brose Fahrzeugteile GmbH & Co. KG, Germany

M. Zäh, Technical University of Munich, Germany

Z. Zalevsky, Bar-Ilan University, Israel

D. Zibar, Technical University of Denmark, Denmark

M. Apel, Access e.V., Germany

E. Ferraris, KU Leuven, Belgium

M.  Lanzetta, University of Pisa, Italy

J. Mergheim, Friedrich-Alexander Universität Erlangen-Nürnberg, Germany

M. Schaper, Paderborn University, Germany

V. Schulze, Karlsruhe Institute of Technology KIT, Germany

J. Sehrt, Ruhr-Universität Bochum, Germany

K. Wudy, Technical University of Munich, Germany

B. M. Colosimo, Polytechnic University of Milan, Italy

S. Huber, Northvolt, Germany

E.  Bordatchev, National Research Council Canady, Canada

G. Requena, RWTH Aachen - DLR, Germany

B. Simonds, National Institute of Standards and Technology (NIST), USA

P. Woizeschke, BIAS, Germany

B. Previtali, Politecnico Milano, Italy

J. Weberpals, AUDI AG, Germany